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“Bravo” Varian Gen II MBE (Status: Operational)
  • History: Donation from Bell Labs, installed 1994 and refurbished 2007
  • Materials:
    • Er – Veeco 10CC high temperature source
    • Ga – Veeco 400g SUMO cell
    • In – Veeco 900g SUMO cell
    • Al – Veeco 200g SUMO cell
    • N – SVTA rf plasma source
    • As – Veeco 500CC valved-cracker
    • Sb – Veeco 200CC valved-cracker
    • Bi – Veeco 250g downward-looking SUMO cell
    • Te – MBE Komponenten tilted crucible dopant source
    • Si – MBE Komponenten tilted crucible dopant source
    • Be – MBE Komponenten tilted crucible dopant source
  • Ancillary Equipment:
    • kSA multibeam optical stress (MOS) system
    • kSA BandiT bandedge/blackbody temperature measurement
    • Staib 15 keV RHEED system
    • kSA RHEED analysis
    • Stanford Research Systems RGA 300
    • Veeco externally adjustable group-III shutters
    • MBE Control AMBER growth software
    • Veeco 3” substrate manipulator
“Echo” EPI MOD Gen II MBE (Status: Operational)
  • History: Purchased in 1995 by NIST, donated to LASE in 2008, refurbished in 2009
  • Materials:
    • La – Veeco 10CC high temperature source
    • Lu – Veeco 10CC high temperature source
    • Ga – Veeco 400g SUMO cell
    • In – Veeco 400g SUMO cell
    • As – Veeco 500CC valved-cracker
    • Bi – Veeco 60cc effusion cell
    • Si/Be – MBE Komponenten custom dual dopant source (Si filament and Be effusion)
    • C – Veeco CBr4 with MBE Control custom injector
    • B - MBE Komponenten EBVV vertical e-beam evaporator (Status: under installation)
    • P – Veeco 500CC valved-cracker (Status: under installation)
    • Al – Veeco 200g SUMO cell (Status: not installed)
    • Gd – Veeco 10CC high temperature source (Status: not installed)
  • Ancillary Equipment:
    • Luxtron low-temperature pyrometer
    • MBE Control EZ-RHEED analysis
    • Stanford Research Systems RGA 200
    • Veeco externally adjustable group-III shutters
    • MBE Control AMBER growth software
    • Custom cryogen-free P-recovery system (Status: under installation)
    • Veeco 3” substrate manipulator
“Foxtrot” (a.k.a. “The Juice”) Varian Chamber (Status: Under installation)
  • History: Donation from UT-Arlington in 2011
  • Materials:
    • Epitaxial plasmonic and emerging materials
  • Ancillary Equipment:
    • Thermionics 6-pocket e-beam evaporator
    • Veeco dual dopant source
    • MBE Komponenten cooling water nipple and shutter
    • Stanford Research Systems RGA 200
Bakeout Structure (BoS) (Status: v2.0)
  • Outgassing MBE components prior to introducing them to the MBE system
  • Equipment:
    • CTI CT10 cryo
    • Stanford Research Systems RGA 200
Optical characterization setups
  • Photoluminescence (PL): Measuring luminescence efficiency, emission wavelength, and so on
  • near/mid-IR Reflection/Transmission (R&T): Measuring absorption and band-edge
  • Pump/probe: Femtosecond carrier dynamics using mode-locked fiber laser
  • Photoreflectance (PR): Measuring band alignments
  • Ancillary equipment:
    • LHe cryostat and controller
Fourier transform infrared spectrometer (FTIR) and IR microscope (Futur-er)
  • FTIR: Bruker Vertex v80
    • Vacuum FTIR with high resolution option (Δν < 0.06 cm-1)
    • Operating range: 5 - 25000 cm-1 (0.4 – 2000 μm)
    • Step scan
    • Rapid scan
  • IR Microscope: Bruker Hyperion 2000
    • Coupled to FTIR for spatial/spectral/temporal mapping
    • Single point MCT detector w/automated stage for imaging
    • ZnSe A ttenuated Total Reflectance (ATR) objective (ZnSe)
    • Grazing Angle Objective (GAO)
  • Accessories:
    • Keysight B1500A semiconductor device analyzer (1x high-power, 2x high-resolution SMUs)
    • MMR variable temperature micro miniature refrigerator w/controller (under installation)
Edge-emitting laser (EEL) test setup
  • CW, pulsed, and temperature-dependant EEL characterization
  • Equipment:
    • Vigo high-speed (ns) MCT detector (5μm cutoff)
    • Princeton Instruments Acton 2500 spectrometer
    • Labsphere Infragold 2" integrating sphere with fiber port
    • ILX Laser drivers - pulsed (LDP-3840B), CW/temperature (LDC-3744)
    • ILX temperature-controlled laser mount (LDM-4415)
    • Neslab recirculating chiller
Probe station
  • I-V: Tunnel junctions characterization and process flow diagnostics (e.g. TLM)
  • Equipment:
    • Micromanipulator 6200 probe station
    • Keysight B1500A semiconductor device analyzer (1x high-power, 2x high-resolution SMUs)
    • HP 4145 semiconductor parameter analyzer
Simulations
  • COMSOL (Windows) - Finite element analysis
  • MEEP (Linux) - FDTD
  • Band diagramming (Linux) - Poisson and Poisson-Schrodinger solvers
Other equipment available through Microelectronics Research Center (NSF-NNCI)
  • Processing: III-V and Si processing (litho, etch, metallization, etc), wafer bonding, lapping/polishing, wire bonding, etc.
  • Characterization: HR-XRD, AFM, TEM, Hall Effect, PPMS, C-V, etc.
Advanced energetics
  • Espresso - Illy Francis Francis! Model X7.1 IperEspresso Machine
  • Pourover (6 cup) - Chemex Classic Series
  • French Press (20 oz.) - Bodum Chambord (all-metal construction)
  • Jura-Capresso Infinity (commercial-grade conical burr grinder)
  • Dairy - Nespresso Aerocinno Plus
Last updated 8/12/2016